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Mold-assisted near-field optical lithography

Identifieur interne : 000386 ( France/Analysis ); précédent : 000385; suivant : 000387

Mold-assisted near-field optical lithography

Auteurs : Y. Chen [France] ; F. Carcenac [France] ; C. Ecoffet [France] ; D. J. Lougnot [France] ; H. Launois [France]

Source :

Abstract

We describe a new approach of mold-assisted lithography based on photopolymerization under near-field regime. In addition to a numerical analysis, we also present the mold fabrication and the replication of sub-100 nm features. The molds were fabricated by electron beam lithography and reactive ion etching of a fused silica substrate covered by a thin film absorber cap layer. Exposures were done after gently pressing the mold into a light curable monomer film. Because of the mold and near-field optical confinements, the resulted organic layer provides not only a thickness contrast but also a material composition contrast, i.e., polymer in unmasked area and monomer in masked parts.


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DOI: 10.1016/S0167-9317(99)00017-9


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ISTEX:F9988E3E72A83E57658856E95C2E27D36833C6B9

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